MICROSTRIP GAS-CHAMBERS ON IAD-COATED SAPPHIRE SUBSTRATES WITH ALUMINUM STRIPS

Citation
Yl. Grishkin et al., MICROSTRIP GAS-CHAMBERS ON IAD-COATED SAPPHIRE SUBSTRATES WITH ALUMINUM STRIPS, Instruments and experimental techniques, 40(1), 1997, pp. 50-53
Citations number
6
Categorie Soggetti
Instument & Instrumentation",Engineering
ISSN journal
00204412
Volume
40
Issue
1
Year of publication
1997
Pages
50 - 53
Database
ISI
SICI code
0020-4412(1997)40:1<50:MGOISS>2.0.ZU;2-2
Abstract
The results of tests of microstrip gas chambers on sapphire substrates with aluminum strips are presented. The ion assistance deposition tec hnique was used to vary the surface resistance of the sapphire. Tests of microstrip gas chambers demonstrated the uniformity of their charac teristics for all strips and their efficiency under high loads (simila r to 10(5) mm(-2) s(-1)).