TEXTURED ZNO THIN-FILMS FOR SOLAR-CELLS GROWN BY A 2-STEP PROCESS WITH THE ATOMIC LAYER DEPOSITION TECHNIQUE

B-doped ZnO films are prepared on Corning 7059 glass by atomic layer d eposition (ALD) using diethylzinc (DEZn), H2O as reactant gases, and d iborane (B2H6) as a dopant gas. A two-step deposition process is intro duced to grow textured and low-resistivity ZnO films by combining the ALD and conventional photo-induced metalorgainc chemical vapor deposit ion (photo-MOCVD) techniques. The electrical and optical properties of ZnO films are effectively improved by depositing lower-resistivity AL D-ZnO films on the textured photo-MOCVD-ZnO films while the textured s urface morphologies are well maintained. Furthermore, the resistivity of the ALD-ZnO film was further improved by the two-step process and a low resistivity of 2.0 x 10(-4) Ohm.cm was achieved for the film whic h was only about 400 nm thick.