TEMPERATURE AND APPLIED VOLTAGE-DEPENDENCE OF MAGNETORESISTANCE RATIOIN FE AL OXIDE FE JUNCTIONS

Citation
N. Tezuka et T. Miyazaki, TEMPERATURE AND APPLIED VOLTAGE-DEPENDENCE OF MAGNETORESISTANCE RATIOIN FE AL OXIDE FE JUNCTIONS, JPN J A P 2, 37(2B), 1998, pp. 218-220
Citations number
14
Categorie Soggetti
Physics, Applied
Volume
37
Issue
2B
Year of publication
1998
Pages
218 - 220
Database
ISI
SICI code
Abstract
The tunnel magnetoresistance(TMR) ratio have been investigated in the Fe/Al oxide/Fe junctions, specifically the temperature and applied vol tage dependence of the TMR ratio. It was found that the dependence of resistance at saturation magnetization state (R-s) on the applied volt age at 4.2 K is completely anomalous in terms of the expected tunnelin g behavior. This ''zero-bias anomaly'' is due to the magnetic impurity in or near the boundary between ferromagnetic electrodes and insulato r. The TMR ratio decreased rapidly with increasing temperature. The TM R ratio also decreased when increasing the applied voltage. We discuss ed the dependence of the TMR ratio on temperature acid applied voltage taking into account the impurity assisted tunneling.