Eh. Choi et al., CONDUCTIVITY AND ION DENSITY OF A PLASMA CHANNEL INDUCED BY A MILDLY RELATIVISTIC ELECTRON-BEAM FROM A GAS-FILLED DIODE, Physics of plasmas, 5(5), 1998, pp. 1514-1521
Conductivity and ion density of a plasma channel induced by a mildly r
elativistic electron beam (300 kV, similar to 2 kA, 10-50 ns) have bee
n experimentally investigated under various gas pressures. Pressures o
f filling gas (air) in this experiment ranged from 10 mTorr to 100 mTT
orr. The net currents of the beam-induced plasma channel were measured
by four Rogowski coils located along the propagating region, while th
e electron beam currents were measured by a Faraday cup. The inductive
plasma currents observed at the above pressure regimes have been char
acterized by magnetic decay time. Plasma-channel conductivity and ion
density induced by the beam are measured along the propagating axial p
ositions under various gas pressures. The numerical result of the ion
density is also obtained at the charge neutralization time when the io
n density is just the same as the electron beam density, and the digit
izing experimental data of the beam current I-b(T) and voltage V-d(t)
have been used. As expected, in both numerical and experimental result
s the ion density increases to a peak value of about 3.0 x 10(11) cm(-
3) and 3.3 x 10(11) cm(-3), respectively, at 50 mTorr and slowly decre
ases for both cases as the gas pressure increases from 50 mTorr to 100
mTorr. Moreover, the results of ion density predicted by the theoreti
cal model developed here are also found to be in remarkably good agree
ment with experimental and numerical results at pressure regimes from
10 mTorr to 100 mTTorr. (C) 1998 American Institute of Physics.