ON THE CONTINUOUS PLUG POTENTIAL PROFILE IN A TANDEM MIRROR

Citation
I. Katanuma et al., ON THE CONTINUOUS PLUG POTENTIAL PROFILE IN A TANDEM MIRROR, Physics of plasmas, 5(5), 1998, pp. 1560-1562
Citations number
10
Categorie Soggetti
Phsycs, Fluid & Plasmas
Journal title
ISSN journal
1070664X
Volume
5
Issue
5
Year of publication
1998
Part
1
Pages
1560 - 1562
Database
ISI
SICI code
1070-664X(1998)5:5<1560:OTCPPP>2.0.ZU;2-D
Abstract
The plug potential is formed experimentally, even without high energy sloshing ion population in the end-mirror cells of a tandem mirror. It has been shown analytically that the plug potential can be formed in the present experimental conditions by using the plausible distributio n functions of ions and electrons and a small ionization source. In th is paper, the required ionization rate is estimated for the continuous potential profile around the plug by using Emmert's source. (C) 1998 American Institute of Physics.