F. Ducroquet et al., DEEP TRAP CHARACTERIZATION AND CONDUCTION-BAND OFFSET DETERMINATION OF AL0.48IN0.52AS (GA0.7AL0.3)(0.48)IN0.52AS HETEROSTRUCTURES/, Materials science and technology, 13(11), 1997, pp. 971-973
The AlGalnAs quaternary alloy represents an alternative to GalnAs as t
he channel material of heterojunction field effect transistors leading
to a reduced impact ionisation effect. The conduction hand offset of
the AlInAs/GaAInAs heterointerface is experimentally determined by cur
rent transport investigation on Schottky diodes. The simulation of the
forward current shows that the thermionic field emission call become
the dominant conduction mechanism in these heterostructures when the t
hickness of the AlInAs barrier is decreased. One main electron trap is
observed by deep level transient spectroscopy in the GaAlInAs layer,
which probably has the source origin as the dominant defect E3 in AlIn
As. (C) 1997 The Institute of Materials.