YBA2CU3O7-X-AG THICK-FILMS DEPOSITED BY PULSED-LASER ABLATION

Ag-doped YBa2Cu3O7-x films, with thickness ranging from 0.06 to 2.5 mu m, were deposited by pulsed laser ablation onto (100) LaAlO3 single-c rystal substrates. The target was YBa2Cu3O7-x with 5 wt.% Ag addition. The presence of Ag in the films in concentrations of similar to 1 at. % was detected by X-ray fluorescence and secondary ion mass spectromet ry (SIMS) analysis. Biaxial alignment of the films was indicated by ph i scans with full-width-half-maximum (FWHM) spread of 1-2 degrees for various thicknesses. Utilizing a standard deposition process, most fil ms showed a critical transition temperature (T-c) > 90 K as measured b y the ac susceptibility technique. Film critical current densities (J( c)) on the order of 10(6) A/cm(2) were measured at 77 K with a four-pr obe technique on a 100-mu m-wide patterned microbridge. (C) 1998 Elsev ier Science B.V.