S. Itoh et R. Hasegawa, MEASUREMENT OF ISOTOPE RATIOS OF BORON AN D SILICON BY GLOW-DISCHARGEMASS-SPECTROMETRY USING A SMALL QUANTITY OF SAMPLE, Nippon Kinzoku Gakkaishi, 62(3), 1998, pp. 289-292
Glow discharge mass spectrometric (GDMS) analysis of isotopic composit
ions of pure boron and silicon has been studied by using a VG9000 inst
rument and a small quantity sample. A disk sample was prepared by pres
surizing the mixture of metallic boron (or silicon) and 1.0 g of galli
um with 39 MPa (400 kg/cm(2)). Optimum ratio of mixing of the sample a
nd the gallium binder was examined. Increasing the sample content of t
he mixture caused a counting error due to the dead time of a Daly dete
ctor, which was estimated to be 0.014 mu s for an integration time of
200 ms. Observed isotopic compositions of metallic boron powder and si
licon thin film showed good agreement with the natural abundance or es
timated values. The relative standard deviation (RSD) of repetitive fi
ve measurements was less than 0.5% for the analytical values of the is
otopic compositions.