Y. Shirakawa et al., HALL-EFFECT MEASUREMENT AND BAND BENDING CALCULATION OF HYDROGENATED DIAMOND FILM GROWN BY CHEMICAL-VAPOR-DEPOSITION, JPN J A P 1, 36(6A), 1997, pp. 3414-3417
The surface conductive layer in a hydrogenated chemical vapor deposite
d diamond film was studied experimentally and analytically. The Hall e
ffect measurement showed that the hole areal density at the surface in
troduced unintentionally was as high as 10(13)/cm(2), which was about
an order of magnitude higher than that used in the conventional field-
effect transistors. We have analyzed the surface band bending from the
quantum-mechanical point of view to determine the equivalent Fermi le
vel pinning position settled after hydrogenation. It was found that, a
t the surface: the Fermi level locates inside the valence band at a de
pth of 0.36eV from the valence band edge.