M. Aryafar et F. Zaera, ISOTHERMAL KINETIC-STUDY OF THE DECOMPOSITION OF NITRIC-OXIDE OVER RH(111) SURFACES, Journal of catalysis, 175(2), 1998, pp. 316-327
The kinetics of the thermal decomposition of NO on Rh(lll) surfaces wa
s probed both by temperature-programmed desorption (TPD) experiments a
nd by isothermal measurements using an extension of the so-called King
and Wells collimated beam method. The TPD studies corroborated previo
usly reported results, including the existence of two distinct N-2 des
orption peaks, the first of which displays apparent first-order kineti
cs. The isothermal work proved that the adsorption of NO is precursor
mediated at low temperatures, and that it is not affected significantl
y by the presence of coadsorbed nitrogen and/or oxygen atoms at any te
mperature below 900 K. The rate of molecular nitrogen production was f
ound to be significant above 450 K and to be controlled by the recombi
nation of atomic nitrogen below 600 K, but the experimental data could
not be reproduced in a satisfactory manner by any empirical rate law
unless the order in nitrogen coverage was set to be less than unity. S
uch an observation is interpreted here as being the result of the slow
diffusion of nitrogen atoms across the surface prior to their recombi
nation. A strong additional effect due to lateral repulsion between ni
trogen and/or oxygen atoms was also inferred from the data. (C) 1998 A
cademic Press.