X-RAY REFLECTIVITY AND SCANNING-TUNNELING-MICROSCOPY STUDY OF SURFACE-ROUGHNESS SCALING OF MOLYBDENUM FILMS

Citation
J. Wang et al., X-RAY REFLECTIVITY AND SCANNING-TUNNELING-MICROSCOPY STUDY OF SURFACE-ROUGHNESS SCALING OF MOLYBDENUM FILMS, Europhysics letters, 42(3), 1998, pp. 283-288
Citations number
21
Categorie Soggetti
Physics
Journal title
ISSN journal
02955075
Volume
42
Issue
3
Year of publication
1998
Pages
283 - 288
Database
ISI
SICI code
0295-5075(1998)42:3<283:XRASSO>2.0.ZU;2-N
Abstract
An X-ray reflectivity (XR) study of the dynamic evolution of the film surface was carried out for molybdenum (Mo) sputter-deposited onto sil icon substrates. The Mo-air interface width grows with time, and exhib its a power law behavior. The growth exponent beta is found to be 0.42 . The time-invariant self-affine behavior an the short-range scale has also been observed, and is consistent with the dynamic scaling theory . The roughness exponent alpha is found to be 0.89 +/- 0.05. Scanning tunneling microscopy (STM) was also used to characterize the surface a nd showed good agreement with the XR measurements.