J. Im et al., STUDIES OF METALLIC SPECIES AND OXYGEN INCORPORATION DURING SPUTTER-DEPOSITION OF SRBI2TA2O9 FILMS, USING MASS-SPECTROSCOPY OF RECOILED IONS, Applied physics letters, 72(20), 1998, pp. 2529-2531
We have recently developed a mass spectroscopy of recoiled ions techni
que which is suitable for monolayer-specific surface analysis of thin
films during growth. We present initial results using this technique t
o study the effect of different bottom electrode layers on metallic sp
ecies and oxygen incorporation in the early stages of SrBi2Ta2O3 (SBT)
film growth via ion beam-sputter deposition. The work discussed here
has been focused on studying the incorporation of Sr, Bi, and Ta durin
g growth of SET on Pt/Ti/SiO2/Si, Pt/MgO, Ti, and Si substrates. We fo
und that the incorporation of Bi in sputter-deposited SET films depend
s critically on the bottom electrode surface composition and the growt
h temperature. (C) 1998 American Institute of Physics. [S0003-6951(98)
00920-6].