STUDIES OF METALLIC SPECIES AND OXYGEN INCORPORATION DURING SPUTTER-DEPOSITION OF SRBI2TA2O9 FILMS, USING MASS-SPECTROSCOPY OF RECOILED IONS

We have recently developed a mass spectroscopy of recoiled ions techni que which is suitable for monolayer-specific surface analysis of thin films during growth. We present initial results using this technique t o study the effect of different bottom electrode layers on metallic sp ecies and oxygen incorporation in the early stages of SrBi2Ta2O3 (SBT) film growth via ion beam-sputter deposition. The work discussed here has been focused on studying the incorporation of Sr, Bi, and Ta durin g growth of SET on Pt/Ti/SiO2/Si, Pt/MgO, Ti, and Si substrates. We fo und that the incorporation of Bi in sputter-deposited SET films depend s critically on the bottom electrode surface composition and the growt h temperature. (C) 1998 American Institute of Physics. [S0003-6951(98) 00920-6].