DIFFUSION OF PT IN MOLECULAR-BEAM EPITAXY-GROWN ZNSE

Citation
J. Slotte et al., DIFFUSION OF PT IN MOLECULAR-BEAM EPITAXY-GROWN ZNSE, Applied physics letters, 72(20), 1998, pp. 2553-2555
Citations number
14
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
72
Issue
20
Year of publication
1998
Pages
2553 - 2555
Database
ISI
SICI code
0003-6951(1998)72:20<2553:DOPIME>2.0.ZU;2-1
Abstract
Diffusion of platinum in zinc selenide has been studied by the use of the He-4 and C-12 ion backscattering techniques. The samples were thin films grown by molecular beam epitaxy on GaAs (100) epitaxial layers followed by evaporation of platinum and annealing in the temperature r ange 500-800 degrees C. The diffusion coefficients were determined by the fitting of a concentration independent solution of the diffusion e quation to the experimental depth profiles. The activation energy and the pre-exponential factor of the diffusion process were found to be 1 .7 eV and 6.4 X 10(-6) cm(2)/s, respectively. (C) 1998 American Instit ute of Physics. [S0003-695 1(98)00220-4].