TEMPERATURE-DEPENDENCE OF IMPACT IONIZATION IN ALGAN-GAN HETEROSTRUCTURE FIELD-EFFECT TRANSISTORS

Citation
N. Dyakonova et al., TEMPERATURE-DEPENDENCE OF IMPACT IONIZATION IN ALGAN-GAN HETEROSTRUCTURE FIELD-EFFECT TRANSISTORS, Applied physics letters, 72(20), 1998, pp. 2562-2564
Citations number
15
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
72
Issue
20
Year of publication
1998
Pages
2562 - 2564
Database
ISI
SICI code
0003-6951(1998)72:20<2562:TOIIIA>2.0.ZU;2-6
Abstract
We report on the studies of the impact ionization in AlGaN-GaN heteros tructure field effect transistors in the temperature range 17-43 degre es C. The results show that the breakdown voltage and the characterist ic electrical field E-i of the impact ionization have a positive tempe rature coefficient. The value of E-i at room temperature is estimated to be approximately 2.6 MV/cm, which agrees with recent theoretical pr ediction. (C) 1998 American Institute of Physics.