SECONDARY-ELECTRON EMISSION PATTERNING OF DIAMOND WITH HYDROGEN AND OXYGEN PLASMAS

Citation
M. Park et al., SECONDARY-ELECTRON EMISSION PATTERNING OF DIAMOND WITH HYDROGEN AND OXYGEN PLASMAS, Applied physics letters, 72(20), 1998, pp. 2580-2582
Citations number
14
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
72
Issue
20
Year of publication
1998
Pages
2580 - 2582
Database
ISI
SICI code
0003-6951(1998)72:20<2580:SEPODW>2.0.ZU;2-L
Abstract
Secondary electron emission patterning of single crystal diamond surfa ces with hydrogen and oxygen plasma treatments was demonstrated. Hydro gen plasma treated regions were much brighter than the oxygen terminat ed regions. Results of atomic force microscopy confirmed that the obse rved contrast is not topographical. Several other possible negative el ectron affinity (or low positive electron affinity) materials such as chemical vapor deposited (CVD) diamond, aluminum nitride, and tetrahed rally bonded amorphous carbon (t(x)a-C1-x) were also investigated. Fai nt image contrast (patterning) was also observed from polycrystalline CVD diamond and polycrystalline aluminum nitride films; however, no co ntrast at all was obtained from tetrahedrally bonded amorphous carbon (t(x)a-C1-x) films. (C) 1998 American Institute of Physics.