T. Nishikawa et al., POROUS LAYER EFFECTS ON SOFT-X-RAY RADIATION EMITTED FROM A PLASMA GENERATED BY 130-FS LASER-PULSES IRRADIATING A POROUS SILICON TARGET, Applied physics. B, Lasers and optics, 66(5), 1998, pp. 567-570
Differences in the X-ray emission by double-pulse excitation with a po
rous Si target and a solid Si target are investigated. The optimum del
ay time between the prepulse and the main pulse for obtaining the high
est soft X-ray emission on porous Si is longer than that for solid Si.
The soft X-ray pulse duration on the porous Si is shorter than that f
or the solid Si and is independent of the prepulse intensity. These di
fferences can be explained by the ablation of Si clusters with solid d
ensity from the porous Si target by the prepulse. A plasma with low av
erage density but high local density is thereby excited by the main pu
lse.