MECHANICAL-PROPERTIES OF (TI1-XALX)N-0.3 FILMS PREPARED BY THE DYNAMIC ION MIXING METHOD

Ti1-xAlxN films were prepared using a dynamic ion mixing apparatus wit h two electron beam evaporation sources. The Ti and Al contents of the films were changed Ly independent control of the evaporation rates oi the two sources at a constant N concentration of 30 at%. The chemical shifts of the films determined by X-ray photoelectron spectroscopy (X PS) were smaller than those of the standard TiN and AlN, because one N atom combined with a Ti and an Al atom. The hardness and wear resista nce of the Ti1-xAlxN films were determined, and it was found that an i ncrease in tile Al content of the films resulted in a decrease in the hardness and the wear resistance. The hardness and wear resistance cha nged drastically with change in rr from 0.5 to 0,64 despite no such ch anges of XPS and X-ray diffraction (XRD). It was obvious from SEM imag es that the film with a 0.5 had a results denser cross-sectional struc ture and a smoother surface than the film with x = 0.64. From the resu lts of mechanical teals, the optimum composition for a film having exc ellent mechanical properties was concluded to be (Ti0.5Al0.5)N-0.3.