Transparent boron nitride (BN) coatings were deposited on glass and Si
substrates in a conventional capacitively coupled RF PACVD system sta
rting from diborane (diluted in helium) and nitrogen. By varying the p
lasma conditions (bias voltage, ion current density), coatings were pr
epared with hardness values ranging from 2 to 12 GPa (measured with a
nano-indenter). Infrared absorption measurements indicated that the BN
was of the hexagonal type. A combination of glancing-angle X-ray diff
raction measurements and simulations shows that the coatings consist o
f hexagonal-type BN crystallites with different degrees of disorder (n
anocrystalline or turbostratic material). High-resolution transmission
electron microscopy analysis revealed the presence of an amorphous in
terface layer and on top of this interface layer a well-developed frin
ge pattern characteristic for the basal planes in h-BN. Depending on t
he plasma process conditions, these fringe patterns showed different d
egrees of disorder as well as different orientational relationships wi
th respect to the substrate surface. These observations were correlate
d with the mechanical properties of the films. (C) 1998 Elsevier Scien
ce S.A.