SURFACE AND INTERFACE MORPHOLOGY OF THIN OXIDE-FILMS INVESTIGATED BY X-RAY REFLECTIVITY AND ATOMIC-FORCE MICROSCOPY

Authors
ALVISI M LEO G RIZZO A TAPFER L VASANELLI L
Citation
M. Alvisi et al., SURFACE AND INTERFACE MORPHOLOGY OF THIN OXIDE-FILMS INVESTIGATED BY X-RAY REFLECTIVITY AND ATOMIC-FORCE MICROSCOPY, Surface & coatings technology, 101(1-3), 1998, pp. 76-79
Citations number
5
Categorie Soggetti
Materials Science, Coatings & Films
Journal title
Surface & coatings technology → ACNP
ISSN journal
02578972
Volume
101
Issue
1-3
Year of publication
1998
Pages
76 - 79
Database
ISI
SICI code
0257-8972(1998)101:1-3<76:SAIMOT>2.0.ZU;2-M
Abstract
In this work, we investigate in details the air/film and film/substrat e interface morphology of single HfO2, SiO2 and ZrO2 films by means of X-ray reflectivity and atomic force microscopy measurements. The film s were deposited on silicon substrate by dual ion beam sputtering tech nique. The roughness obtained from the X-ray scattering experiments we re compared with the atomic force microscopy data. (C) 1998 Published by Elsevier Science S.A.