MAKING OF SPECIFIC ELECTRODES BY CVD

SnO2 thin films were deposited on Ti substrates by metal-organic chemi cal vapor deposition using the reactive gas mixture SnEt4-O-2 to prepa re electrode materials. A kinetic study of the growth process has been carried out as a function of the deposition parameters and a simulati on model of the growth rate was used to obtain rapidly thickness varia tions on flat substrates of less than 2% along the axis of the reactor over an isothermal length of 150 mm long. This deposition process has been used for the preparation of SnO2/Ti electrodes subsequently used in the electrochemical treatment of industrial wastewater. (C) 1998 P ublished by Elsevier Science S.A.