OXIDATION AND STRUCTURAL-CHANGES IN FCC TINX THIN-FILMS STUDIED WITH X-RAY REFLECTIVITY

The evolution of oxidation process at room temperature of thin fee tit anium nitride (TiNx) films grown by DC reactive magnetron sputtering w as studied by X-ray reflectivity (XRR) measurements and supported with in situ spectroscopic ellipsometry (SE) measurements. Precise thin-fi lm thickness and density as well as surface roughness were determined from X-ray specular reflectivity data analysis. The XRR measurements w ere conducted with a conventional diffractometer equipped with a Gobel mirror and a special reflectivity sample stage. The XRR results obtai ned from the TINx films during exposure to air show an exponential inc rease in density and thickness and a decrease in the value of RMS surf ace roughness. Analysis of the SE results shows that oxidation takes p lace in the hulk of the TiNx film transforming it to titanium oxide. T he percentage of transformation and the type of the oxide depends on t he TiNx film stoichiometry. The above structural and compositional cha nges are consistent with the evolution of stress (compressive) measure d in the TINx films during exposure to air by cantilever technique. (C ) 1998 Elsevier Science S.A.