LASER-ABLATION AND DEPOSITION OF BORON-NITRIDE IN A VACUUM AND IN THEPRESENCE OF N-2 AND NH3

Citation
R. Teghil et al., LASER-ABLATION AND DEPOSITION OF BORON-NITRIDE IN A VACUUM AND IN THEPRESENCE OF N-2 AND NH3, Surface & coatings technology, 101(1-3), 1998, pp. 433-436
Citations number
15
Categorie Soggetti
Materials Science, Coatings & Films
ISSN journal
02578972
Volume
101
Issue
1-3
Year of publication
1998
Pages
433 - 436
Database
ISI
SICI code
0257-8972(1998)101:1-3<433:LADOBI>2.0.ZU;2-O
Abstract
Hexagonal boron nitride pellets have been evaporated by a doubled Nd:Y AG laser, and the removed material has been deposited on to Si (100) s ubstrates. The ablation has been performed either in a vacuum or in th e presence of nitrogen and ammonia at different pressures. The laser f luence and substrate temperature have been varied to optimise the depo sition conditions. The best films, from a morphological and compositio nal point of view, were deposited in a nitrogen atmosphere at room tem perature. (C) 1998 Elsevier Science S.A.