C. Beleznai et al., UV LASER-INDUCED CLEANING OF NATIVE-OXIDE-COVERED W PHOTOCATHODES - THE EFFECT OF RECONTAMINATION AT VARIOUS PRESSURES, Surface & coatings technology, 101(1-3), 1998, pp. 450-454
The fifth harmonic (213 nm) of a picosecond Nd3+:YAG laser was used to
remove small fractions of the covering oxide overlayer from polycryst
alline metallic photocathodes. The evolution of the photoemitted charg
e (high-density electron pulses) was followed along with the surface r
eflectivity change, and they were interpreted in terms of the work fun
ction change of the surface. The careful choice of the laser fluence e
nables us to investigate the cleaning kinetics within a relatively nar
row coverage range. Moreover, after recontaminating the surface at dif
ferent pressures, we observe distinct kinetics as well. This latter ef
fect is explained by the various rates of oxygen incorporation into th
e oxide lattice, resulting in a looser, rougher surface for high press
ures and a more compact oxide for low pressures. (C) 1998 Elsevier Sci
ence S.A.