SURFACE-MORPHOLOGY EVOLUTION OF CHEMICAL-VAPOR-DEPOSITED TUNGSTEN FILMS ON SI(100)

Authors
VAZQUEZ L SALVAREZZA RC ALBANO E ARVIA AJ CREUS AH LEVY RA ALBELLA JM
Citation
L. Vazquez et al., SURFACE-MORPHOLOGY EVOLUTION OF CHEMICAL-VAPOR-DEPOSITED TUNGSTEN FILMS ON SI(100), CHEMICAL VAPOR DEPOSITION, 4(3), 1998, pp. 89
Citations number
19
Categorie Soggetti
Materials Science, Coatings & Films",Electrochemistry,"Physics, Condensed Matter
Journal title
CHEMICAL VAPOR DEPOSITION → ACNP
ISSN journal
09481907
Volume
4
Issue
3
Year of publication
1998
Database
ISI
SICI code
0948-1907(1998)4:3<89:SEOCTF>2.0.ZU;2-1
Abstract
Communication: CVD tungsten films have many technological applications , and for most cases it is desirable to control the film surface struc ture. Several growth models have been proposed, but predictions have b een difficult to check due to lack of systematic experiments. This wor k gives results for dynamics of LPCVD tungsten surfaces and makes a co mparison with predicted behavior. A scanning tunneling microscopy imag e of a rough film is shown.