C. Vahlas et al., DRIVING-FORCE FOR FREE-CARBON INCORPORATION IN CHROMIUM CARBIDE FILMSPROCESSED BY MOCVD, CHEMICAL VAPOR DEPOSITION, 4(3), 1998, pp. 96
Communication: The clean decomposition of suitably tailored precursors
without contamination of the growing film, especially by carbon from
organometallic precursors, is a key requirement for successful deposit
ion by MOCVD. The dependence on deposition variables of the supersatur
ation and the driving force for the deposition of free carbon in the C
VD of chromium carbides is evaluated here. The approach allows the add
ition of iso-supersaturation and iso-activity lines to the conventiona
l stability or CVD diagrams.