DRIVING-FORCE FOR FREE-CARBON INCORPORATION IN CHROMIUM CARBIDE FILMSPROCESSED BY MOCVD

Citation
C. Vahlas et al., DRIVING-FORCE FOR FREE-CARBON INCORPORATION IN CHROMIUM CARBIDE FILMSPROCESSED BY MOCVD, CHEMICAL VAPOR DEPOSITION, 4(3), 1998, pp. 96
Citations number
5
Categorie Soggetti
Materials Science, Coatings & Films",Electrochemistry,"Physics, Condensed Matter
Journal title
ISSN journal
09481907
Volume
4
Issue
3
Year of publication
1998
Database
ISI
SICI code
0948-1907(1998)4:3<96:DFFIIC>2.0.ZU;2-O
Abstract
Communication: The clean decomposition of suitably tailored precursors without contamination of the growing film, especially by carbon from organometallic precursors, is a key requirement for successful deposit ion by MOCVD. The dependence on deposition variables of the supersatur ation and the driving force for the deposition of free carbon in the C VD of chromium carbides is evaluated here. The approach allows the add ition of iso-supersaturation and iso-activity lines to the conventiona l stability or CVD diagrams.