Dk. Russell et al., THE KINETICS AND MECHANISM OF THE PYROLYSIS OF MANGANESE AND MANGANESE SILICIDE CVD PRECURSORS, CHEMICAL VAPOR DEPOSITION, 4(3), 1998, pp. 103-107
The gas-phase pyrolysis of methyl pentacarbonyl manganese and acetyl p
entacarbonyl manganese, both alone and in the presence of trimethyl si
lane, has been investigated using stirred flow reactor kinetic measure
ments and IR laser powered pyrolysis, together with electron spin reso
nance (ESR) detection of radical intermediates. For methyl pentacarbon
yl manganese alone, all observations support a mechanism initiated by
methyl-manganese bond homolysis, whereas the initial step in the acety
l compound involves CO loss and methyl migration. The addition of trim
ethylsilane sensitizes decomposition of MeMn(CO)(5), yielding methane
and trimethylsilyl pentacarbonyl manganese; on the other hand, Me3SiH
has little effect on the rate of decomposition of MeCOMn(CO)(5). A mec
hanism based on methyl migration is proposed to account for these obse
rvations.