THE KINETICS AND MECHANISM OF THE PYROLYSIS OF MANGANESE AND MANGANESE SILICIDE CVD PRECURSORS

Citation
Dk. Russell et al., THE KINETICS AND MECHANISM OF THE PYROLYSIS OF MANGANESE AND MANGANESE SILICIDE CVD PRECURSORS, CHEMICAL VAPOR DEPOSITION, 4(3), 1998, pp. 103-107
Citations number
48
Categorie Soggetti
Materials Science, Coatings & Films",Electrochemistry,"Physics, Condensed Matter
Journal title
ISSN journal
09481907
Volume
4
Issue
3
Year of publication
1998
Pages
103 - 107
Database
ISI
SICI code
0948-1907(1998)4:3<103:TKAMOT>2.0.ZU;2-P
Abstract
The gas-phase pyrolysis of methyl pentacarbonyl manganese and acetyl p entacarbonyl manganese, both alone and in the presence of trimethyl si lane, has been investigated using stirred flow reactor kinetic measure ments and IR laser powered pyrolysis, together with electron spin reso nance (ESR) detection of radical intermediates. For methyl pentacarbon yl manganese alone, all observations support a mechanism initiated by methyl-manganese bond homolysis, whereas the initial step in the acety l compound involves CO loss and methyl migration. The addition of trim ethylsilane sensitizes decomposition of MeMn(CO)(5), yielding methane and trimethylsilyl pentacarbonyl manganese; on the other hand, Me3SiH has little effect on the rate of decomposition of MeCOMn(CO)(5). A mec hanism based on methyl migration is proposed to account for these obse rvations.