ELECTRON-TRANSPORT IN POROUS SILICON

Citation
Rm. Mathur Rg",vivechana,"mehra et al., ELECTRON-TRANSPORT IN POROUS SILICON, Thin solid films, 312(1-2), 1998, pp. 254-258
Citations number
41
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
312
Issue
1-2
Year of publication
1998
Pages
254 - 258
Database
ISI
SICI code
0040-6090(1998)312:1-2<254:EIPS>2.0.ZU;2-9
Abstract
Low field and high field DC conductivity measurements have been made o n macroporous p-type porous silicon (PS) samples prepared bg anodic di ssolution. The conduction mechanism is found to be due to Variable Ran ge Hopping near the Fermi level for temperature below 150 It. At high temperatures the conduction is due to the tunneling of carriers in the localized states in the band edges near the valence band. The analysi s of the data shows that PS presents a fractal structure between 1D an d 2D systems. (C) 1998 Elsevier Science S.A.