DELTA-DOPING AND THE POSSIBILITY OF WIRE-LIKE INCORPORATION OF SI ON GAAS VICINAL SURFACES IN METALORGANIC VAPOR-PHASE EPITAXIAL-GROWTH

We have investigated the delta-doping of Si on GaAs vicinal surfaces o n which self-organized multiatomic steps are formed during metalorgani c vapor phase epitaxy (MOVPE) and the possibility of its wire-like sel ective incorporation into step edges to form doping quantum wires (DQW Rs). We evaluated the electrical characteristics of delta-doped layers by Hall and C-V measurements and investigated their dependence on mis orientation angles of GaAs vicinal substrates and doping time. The inc orporation of Si is enhanced by steps. This effect is particularly imp ortant at the initial stage of delta-doping when the surface coverage of Si is not high. Our results also suggest that the doping density at multiatomic step regions is higher than at terrace regions. Therefore , it is expected that the selective wire-like incorporation of Si take s place at the step edges, and DQWRs can be realized under suitable gr owth conditions.