NANOTECHNOLOGY AND MICROTECHNOLOGY APPLICATIONS OF FOCUSED ION-BEAM PROCESSING

Authors
MOORE DF DANIEL JH WALKER JF
Citation
Df. Moore et al., NANOTECHNOLOGY AND MICROTECHNOLOGY APPLICATIONS OF FOCUSED ION-BEAM PROCESSING, Microelectronics, 28(4), 1997, pp. 465-473
Citations number
35
Categorie Soggetti
Engineering, Eletrical & Electronic
Journal title
Microelectronics → ACNP
ISSN journal
00262692
Volume
28
Issue
4
Year of publication
1997
Pages
465 - 473
Database
ISI
SICI code
0026-2692(1997)28:4<465:NAMAOF>2.0.ZU;2-N
Abstract
Advances in focused ion beam technology including higher current densi ty, finely focused beams under computer control are making micromachin ing an excellent prototyping route for devices and a commercial possib ility for production. This paper concentrates on new applications of f ocused ion beam processing in Si based microdevices and in sensors, in cluding high-resolution patterning of YBaCuO superconducting Josephson junction devices. (C) 1997 Elsevier Science Ltd.