ON THE STRUCTURE AND COMPOSITION OF POLYCRYSTALLINE CARBON NITRIDE FILMS SYNTHESIZED BY REACTIVE RF MAGNETRON SPUTTERING

Citation
S. Xu et al., ON THE STRUCTURE AND COMPOSITION OF POLYCRYSTALLINE CARBON NITRIDE FILMS SYNTHESIZED BY REACTIVE RF MAGNETRON SPUTTERING, Chemical physics letters, 287(5-6), 1998, pp. 731-736
Citations number
18
Categorie Soggetti
Physics, Atomic, Molecular & Chemical
Journal title
ISSN journal
00092614
Volume
287
Issue
5-6
Year of publication
1998
Pages
731 - 736
Database
ISI
SICI code
0009-2614(1998)287:5-6<731:OTSACO>2.0.ZU;2-0
Abstract
Polycrystalline beta-C3N4 films have been deposited on single-crystal KCl(100) substrates using reactive rf magnetron sputtering. The films have been characterized by transmission electron microscopy (TEM), X-r ay photoelectron spectroscopy (XPS) and atomic force microscopy. A lar ge number of grains are found distributed in various regions of the fi lm. The dimension of the largest grain is about 4 mu m. The film is co mposed mainly of C and N with a small amount of O. XPS data show N-bon ded to sp(3)-hybridized C with some surface oxidation. The N/C ratio i n the beta-C3N4 region is deduced to be 1.23-1.27, close to an expecte d stoichiometric value of 1.33. The TED-measured interplanar spacings suggest that the crystalline grains are hexagonal with lattice paramet ers of a = 6.30 Angstrom and c = 2.46 Angstrom. (C) 1998 Elsevier Scie nce B.V. All rights reserved.