DYNAMICS IN PULSED-LASER DEPOSITION OF CERAMICS - EXPERIMENTAL, THEORETICAL AND NUMERICAL-STUDIES

Citation
Ew. Kreutz et J. Gottmann, DYNAMICS IN PULSED-LASER DEPOSITION OF CERAMICS - EXPERIMENTAL, THEORETICAL AND NUMERICAL-STUDIES, Physica status solidi. a, Applied research, 166(2), 1998, pp. 569-580
Citations number
19
Categorie Soggetti
Physics, Condensed Matter
ISSN journal
00318965
Volume
166
Issue
2
Year of publication
1998
Pages
569 - 580
Database
ISI
SICI code
0031-8965(1998)166:2<569:DIPDOC>2.0.ZU;2-0
Abstract
The dynamics in energy coupling, material removal, material transfer, and film growth are studied experimentally, theoretically and numerica lly for pulsed laser deposition of ceramics. Excimer laser radiation i s investigated as a function of laser parameters (fluence, repetition rate, beam geometry) and processing variables (pressure and compositio n of processing gas, target-substrate arrangement) in order to deposit thin ceramic (Al2O3, ZrO2, BaTiO3, PZT) films on Si and SrTiO3 substr ates including buffer layers. The laser parameters and processing vari ables achieve different vapor and/or plasma states represented in the type, number, momentum and energy of the ensembles of species generate d, which are used to deposit thin films with defined properties in vie w of electronic and optical applications.