Ew. Kreutz et J. Gottmann, DYNAMICS IN PULSED-LASER DEPOSITION OF CERAMICS - EXPERIMENTAL, THEORETICAL AND NUMERICAL-STUDIES, Physica status solidi. a, Applied research, 166(2), 1998, pp. 569-580
The dynamics in energy coupling, material removal, material transfer,
and film growth are studied experimentally, theoretically and numerica
lly for pulsed laser deposition of ceramics. Excimer laser radiation i
s investigated as a function of laser parameters (fluence, repetition
rate, beam geometry) and processing variables (pressure and compositio
n of processing gas, target-substrate arrangement) in order to deposit
thin ceramic (Al2O3, ZrO2, BaTiO3, PZT) films on Si and SrTiO3 substr
ates including buffer layers. The laser parameters and processing vari
ables achieve different vapor and/or plasma states represented in the
type, number, momentum and energy of the ensembles of species generate
d, which are used to deposit thin films with defined properties in vie
w of electronic and optical applications.