A variable-duty cycle-pulsed radio frequency discharge is shown to pro
vide film chemistry control during plasma polymerization of acryloyl c
hloride. A nonlinear dependence is observed between the percent retent
ion of acid chloride groups in the deposited films and the average pow
er input during plasma polymerization. Significant C(O)C1 group retent
ion is observed only under conditions of exceptionally low power input
, as made available in the pulsed experiments. Additionally, relativel
y large scale systematic changes in surface morphology and film format
ion rates are observed with sequential variations in the plasma duty c
ycle employed during film formation. Specifically, film surface roughn
ess decreases and the film thickness per joule of input energy increas
es as the plasma duty cycles employed are decreased. The plasma-genera
ted films were employed in subsequent chemical reactions to attach tar
get molecules to the substrate surfaces via facile reactions with the
surface acid chloride groups. This concept is illustrated in the prese
nt paper with reactions of 1,1,1-trifluoroethanol and allylamine with
the plasma-modified surfaces. The results obtained are supportive of t
he use of the ultralow-energy pulsed plasma technique to introduce rea
ctive surface groups, followed by subsequent covalent coupling of targ
et molecules, as a viable new route to molecular tailoring of surfaces
.