SCANNING TUNNELING MICROSCOPIC INVESTIGATION OF K-X(H2O)(Y)MOS2

Citation
F. Wypych et al., SCANNING TUNNELING MICROSCOPIC INVESTIGATION OF K-X(H2O)(Y)MOS2, Surface science, 380(1), 1997, pp. 474-478
Citations number
28
Categorie Soggetti
Chemistry Physical
Journal title
ISSN journal
00396028
Volume
380
Issue
1
Year of publication
1997
Pages
474 - 478
Database
ISI
SICI code
0039-6028(1997)380:1<474:STMIOK>2.0.ZU;2-9
Abstract
The intercalation compound K-x(H2O)(y)MoS2 has been investigated by me ans of scanning tunneling microscopy. Ln contrast to 2H-MoS2, every Mo center in this compound is octahedrally surrounded by six sulfur liga nds, whereas the hydrated K+ cations are located in the van der Waals gap between the layers. Analysis of the STM data showed that the surfa ce structure within the (a,b) plane of K-x(H2O)(y)MoS2 is composed of parallel rows of sulfur atoms which are formed by sulfur ligands locat ed at axial positions in the [MoS6] octahedra. Due to the distortion w ithin the octahedra a wavy surface structure with an (axa root 3) supe rstructure is formed.