We review the structural changes on the Si(111)-7 x 7 surface induced
by irradiation of laser pulses with fluences below thresholds of melti
ng and ablation. Atomic imaging of the irradiated surface by scanning
tunnelling microscopy has shown that the bond breaking of adatoms of t
his 7 x 7 structure, associated with Si-atom desorption, is induced by
an electronic process. Bond breaking efficiency is strongly site-sens
itive, resonantly wavelength-dependent, and highly non-linear with res
pect to the excitation intensity. The electronic process responsible f
or bond breaking is shown to originate from non-linear localization of
excited species generated from surface electronic states. (C) 1998 El
sevier Science B.V.