ZnSe and ZnO films have been deposited on (001) GaAs substrates under
different pressures by pulsed-laser deposition (PLD) with a 193 nm las
er beam. The ambient pressures were changed from 8 x 10(-6) to 5 x 10(
-2) Torr with high-purity argon gas for ZnSe and oxygen gas for ZnO. X
-ray diffraction (XRD) measurement was performed on these samples. The
FWHM's of X-ray theta-rocking curves for the (004) peaks of ZnSe film
s were less than 0.5 degrees. X-ray data show that high-quality ZnO fi
lms can be also synthesized by PLD. (C) 1998 Elsevier Science B.V.