CHARACTERIZATION OF A MULTILAYER SOFT-X-RAY REFLECTOR FABRICATED BY PULSED-LASER DEPOSITION

A Mo/Si multilayer (ML) has been fabricated as a reflector in the soft X-ray spectral region by pulsed laser deposition (PLD), using the sec ond harmonic of Nd/YAG pulsed laser (5 ns, 532 nm light). The ML struc ture was characterized by transmission electron microscopy (TEM), smal l-angle X-ray scattering (SAXS) and photoelectron spectroscopy for che mical analysis (ESCA). The near-normal incidence reflectivity in the s pectral range of 14-17 nm was measured using a soft X-ray reflectomete r based on a laser-produced plasma. The structural parameters were eva luated by fitting to both the SAXS profile and the soft X-ray reflecta nce measurement with asymmetric interface profile, roughness and compo sition taken into account. (C) 1998 Elsevier Science B.V.