PLANARIZATION OF SUBSTRATE SURFACE BY MEANS OF ULTRATHIN DIAMOND-LIKECARBON-FILM

Authors
BARANOV AM
Citation
Am. Baranov, PLANARIZATION OF SUBSTRATE SURFACE BY MEANS OF ULTRATHIN DIAMOND-LIKECARBON-FILM, Surface & coatings technology, 102(1-2), 1998, pp. 154-158
Citations number
16
Categorie Soggetti
Materials Science, Coatings & Films
Journal title
Surface & coatings technology → ACNP
ISSN journal
02578972
Volume
102
Issue
1-2
Year of publication
1998
Pages
154 - 158
Database
ISI
SICI code
0257-8972(1998)102:1-2<154:POSSBM>2.0.ZU;2-9
Abstract
The effect of reactive ion etching on surface roughness of diamond-lik e carbon (DLC) films was investigated. The DLC carbon films were depos ited by d.c. magnetron sputtering of graphite target and r.f. plasma-e nhanced chemical vapor deposition at room temperature. Plasma etching of DLC films were performed by r.f. reactive ion etching in oxygen. It is shown that the surface roughness of the diamond-like carbon film u nder reactive ion etching was less than that of the original substrate . (C) 1998 Elsevier Science S.A.