TITANIUM IMPLANTATION IN BULK AND THIN-FILM AMORPHOUS SILICA

Both bulk and thin film amorphous silica implanted with titanium were investigated. We studied the induced modifications of the microstructu re and the consequences on the optical properties. We determined the r efractive index profile of implanted materials from guided wave measur ements and we show that it matches the distribution of titanium. An in crease in refractive index of up to 0.9 can be obtained by high dose i mplantation. A study of thermal annealing in air shows that the implan ted materials exhibit low optical losses. (C) 1998 American Institute of Physics.