T. Salditt et al., ELASTIC-SCATTERING UNDER SIMULTANEOUS EXCITATION OF X-RAY STANDING WAVES IN MULTILAYERS, Journal of applied physics, 83(10), 1998, pp. 5179-5184
We have measured the structure factor of diffuse scattering and amorph
ous scattering in a W/Si multilayer under simultaneous excitation of x
-ray standing waves. The tuning of the nodes and antinodes to the loca
tion of the W and Si sublayers or to the respective interfaces increas
es the selective sensitivity to the structure of the respective sublay
er or interface. The dynamically broadened first multilayer Bragg peak
is modeled by the Darwin theory of dynamic diffraction, which allows
for the exact determination of the standing wave phase. The decay of d
iffuse intensity, as measured in a grazing incidence geometry at diffe
rent standing wave phase shifts, indicates that the height-height self
-correlation function is of the same form for both types of interfaces
, W/Si and Si/W. The amorphous peaks of the Si sublayer can only be ob
served if the angles of incidence and exit are optimized to suppress t
he scattering from the otherwise dominating W layers. The peak positio
ns are the same as for bulk amorphous silicon. (C) 1998 American Insti
tute of Physics.