M. Tachiki et al., SRTIO3 FILMS EPITAXIALLY GROWN BY ECLIPSE PULSED-LASER DEPOSITION ANDTHEIR ELECTRICAL CHARACTERIZATION, Journal of applied physics, 83(10), 1998, pp. 5351-5357
Epitaxial (100)SrTiO3 (STO) thin films were grown successfully on (100
)La0.7Sr0.3MnO3/(100)MgO substrates by eclipse pulsed laser deposition
in (O-2+Ar) ambient gas. The droplet-free STO films showed marked imp
rovement in their permittivity, 320 epsilon(0) at room temperature. Ti
me-resolved plume observation and spectrum measurement suggested that
the improvement was due to effective excitation and ionization of grow
th species in the plume with the aid of coexisting Ar. The STO films a
lso showed nonlinear permittivity against the applied field, as common
ly observed in single-crystal bulk STO. Using this nonlinear character
istic and hole injection into the STO valence band, we deduced the hol
e trap concentration in the STO films. The concentration was on the or
der of 10(18)cm(-3). (C) 1998 American Institute of Physics.