SRTIO3 FILMS EPITAXIALLY GROWN BY ECLIPSE PULSED-LASER DEPOSITION ANDTHEIR ELECTRICAL CHARACTERIZATION

Citation
M. Tachiki et al., SRTIO3 FILMS EPITAXIALLY GROWN BY ECLIPSE PULSED-LASER DEPOSITION ANDTHEIR ELECTRICAL CHARACTERIZATION, Journal of applied physics, 83(10), 1998, pp. 5351-5357
Citations number
28
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
83
Issue
10
Year of publication
1998
Pages
5351 - 5357
Database
ISI
SICI code
0021-8979(1998)83:10<5351:SFEGBE>2.0.ZU;2-H
Abstract
Epitaxial (100)SrTiO3 (STO) thin films were grown successfully on (100 )La0.7Sr0.3MnO3/(100)MgO substrates by eclipse pulsed laser deposition in (O-2+Ar) ambient gas. The droplet-free STO films showed marked imp rovement in their permittivity, 320 epsilon(0) at room temperature. Ti me-resolved plume observation and spectrum measurement suggested that the improvement was due to effective excitation and ionization of grow th species in the plume with the aid of coexisting Ar. The STO films a lso showed nonlinear permittivity against the applied field, as common ly observed in single-crystal bulk STO. Using this nonlinear character istic and hole injection into the STO valence band, we deduced the hol e trap concentration in the STO films. The concentration was on the or der of 10(18)cm(-3). (C) 1998 American Institute of Physics.