TEMPERATURE-DEPENDENCE OF SIGE COHERENT ISLAND FORMATION ON SI(100) -ANOMALOUS REENTRANT BEHAVIOR

Citation
X. Deng et al., TEMPERATURE-DEPENDENCE OF SIGE COHERENT ISLAND FORMATION ON SI(100) -ANOMALOUS REENTRANT BEHAVIOR, Physical review letters, 80(21), 1998, pp. 4721-4724
Citations number
17
Categorie Soggetti
Physics
Journal title
ISSN journal
00319007
Volume
80
Issue
21
Year of publication
1998
Pages
4721 - 4724
Database
ISI
SICI code
0031-9007(1998)80:21<4721:TOSCIF>2.0.ZU;2-C
Abstract
Studies of the temperature dependence (450-800 degrees C) of coherent island formation in SiGe alloys (nominal composition similar to 25% Ge ) on Si(100) reveal an anomalous islanding behavior. Three dimensional island formation appears to be suppressed at temperatures below 450 d egrees C, and again in a narrow temperature window near similar to 600 degrees C. At all other temperatures, faceted 3D islands are observed . The anomalous effect at intermediate temperatures is qualitatively e xplained on the basis of a relative reduction in the driving force due to temperature dependent behavior of Ge segregation and interdiffusio n.