X. Deng et al., TEMPERATURE-DEPENDENCE OF SIGE COHERENT ISLAND FORMATION ON SI(100) -ANOMALOUS REENTRANT BEHAVIOR, Physical review letters, 80(21), 1998, pp. 4721-4724
Studies of the temperature dependence (450-800 degrees C) of coherent
island formation in SiGe alloys (nominal composition similar to 25% Ge
) on Si(100) reveal an anomalous islanding behavior. Three dimensional
island formation appears to be suppressed at temperatures below 450 d
egrees C, and again in a narrow temperature window near similar to 600
degrees C. At all other temperatures, faceted 3D islands are observed
. The anomalous effect at intermediate temperatures is qualitatively e
xplained on the basis of a relative reduction in the driving force due
to temperature dependent behavior of Ge segregation and interdiffusio
n.