SIMULTANEOUS DETERMINATION OF REFLECTANCE SPECTRA ALONG WITH (PSI(E),DELTA(E)) IN MULTICHANNEL ELLIPSOMETRY - APPLICATIONS TO INSTRUMENT CALIBRATION AND REDUCTION OF REAL-TIME DATA
I. An et al., SIMULTANEOUS DETERMINATION OF REFLECTANCE SPECTRA ALONG WITH (PSI(E),DELTA(E)) IN MULTICHANNEL ELLIPSOMETRY - APPLICATIONS TO INSTRUMENT CALIBRATION AND REDUCTION OF REAL-TIME DATA, Thin solid films, 313, 1998, pp. 79-84
We describe applications of the rotating polarizer multichannel ellips
ometer for three-parameter spectroscopy (1.4-4.1 eV), in which a full
reflectance spectrum is acquired simultaneously with (psi, Delta), all
in a time as short as 16 ms. Because data acquisition requires no sig
nificant effort beyond that of spectroscopic ellipsometry, the challen
ge of three-parameter spectroscopy becomes one of utilizing the third
parameter effectively. Here, we demonstrate its utility in measurement
s either vs. fixed analyzer angular setting A for instrument calibrati
on or vs. time for kinetic studies of nucleating films. In calibration
, accurate results for the polarizer phase and analyzer azimuth scale
correction can be obtained from measurements of the average reflected
irradiance vs. A in the sample measurement configuration, irrespective
of the value of Delta for the surface. In the kinetic studies of thin
-film nucleation, the reflectance spectrum provides a criterion that a
llows one to identify the correct thickness and thus extract the evolu
tion of the dielectric function with thickness. This procedure is demo
nstrated for Ag thin-film nucleation by magnetron sputtering on Si sub
strates. (C) 1998 Elsevier Science S.A.