MEASUREMENT OF THE ABSORPTION-EDGE OF THICK TRANSPARENT SUBSTRATES USING THE INCOHERENT REFLECTION MODEL AND SPECTROSCOPIC UV VISIBLE NEAR IR ELLIPSOMETRY

Citation
M. Kildemo et al., MEASUREMENT OF THE ABSORPTION-EDGE OF THICK TRANSPARENT SUBSTRATES USING THE INCOHERENT REFLECTION MODEL AND SPECTROSCOPIC UV VISIBLE NEAR IR ELLIPSOMETRY, Thin solid films, 313, 1998, pp. 108-113
Citations number
12
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
313
Year of publication
1998
Pages
108 - 113
Database
ISI
SICI code
0040-6090(1998)313:<108:MOTAOT>2.0.ZU;2-V
Abstract
A model taking into account the incoherent reflection in a thick trans parent substrate (approx. 1 mm) is described and tested. The incoheren t model makes it possible to calculate the averaged elements of the Mu eller matrix describing the sample, for comparison with data obtained by Spectroscopic Phase Modulated Ellipsometry (SPME). By performing PM E in two different configurations, the degree of polarisation is calcu lated from the measured intensities and compared to the theory. The st rong transition from incoherent to coherent reflection at the onset of the extinction or absorption edge, makes it possible to measure extre mely weak extinction coefficients (k similar to 10(-5)) using ellipsom etry. In particular, the electronic absorption edge in the UV-visit?le region, giving the transition from incoherent to coherent reflection, is found to be adequately modelled by the Forouhi-Bloomer (F and B) o r the Tauc-Lorentz (TL) dispersion formulas. Industrial applications o f ellipsometry often involve transparent substrates and examples of ch aracterisation of thin films on glass are given. (C) 1998 Elsevier Sci ence S.A.