SPECTROSCOPIC ELLIPSOMETRY AND LOW-TEMPERATURE REFLECTANCE - COMPLEMENTARY ANALYSIS OF GAN THIN-FILMS

Citation
Nv. Edwards et al., SPECTROSCOPIC ELLIPSOMETRY AND LOW-TEMPERATURE REFLECTANCE - COMPLEMENTARY ANALYSIS OF GAN THIN-FILMS, Thin solid films, 313, 1998, pp. 187-192
Citations number
27
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
313
Year of publication
1998
Pages
187 - 192
Database
ISI
SICI code
0040-6090(1998)313:<187:SEALR->2.0.ZU;2-V
Abstract
We report spectroscopic ellipsometry (SE) and low-temperature reflecta nce data on epitaxial GaN thin-film samples covering the widest range of tensile and compressive stress (-3.8 to 3.5 kbar) thus far. SE allo ws us to assess the preparation of smooth and abrupt GaN surfaces by c hemical treatments in real time, and, coupled with the reflectance dat a. the Edn/dE contribution to dispersion, which is important for laser action. The reflectance data explicitly show the non-linear behavior of the B-A and C-A splittings vs. the energy of the A exciton. Linesha pe ambiguities that hindered previous interpretations have been resolv ed with reciprocal space analysis, allowing us to obtain band paramete rs such as Delta(SO) = 17.0 +/- 1 meV and Delta(CF) = 9.8 +/- 1 meV wi th increased confidence. (C) 1998 Published by Elsevier Science S.A.