Nv. Edwards et al., SPECTROSCOPIC ELLIPSOMETRY AND LOW-TEMPERATURE REFLECTANCE - COMPLEMENTARY ANALYSIS OF GAN THIN-FILMS, Thin solid films, 313, 1998, pp. 187-192
We report spectroscopic ellipsometry (SE) and low-temperature reflecta
nce data on epitaxial GaN thin-film samples covering the widest range
of tensile and compressive stress (-3.8 to 3.5 kbar) thus far. SE allo
ws us to assess the preparation of smooth and abrupt GaN surfaces by c
hemical treatments in real time, and, coupled with the reflectance dat
a. the Edn/dE contribution to dispersion, which is important for laser
action. The reflectance data explicitly show the non-linear behavior
of the B-A and C-A splittings vs. the energy of the A exciton. Linesha
pe ambiguities that hindered previous interpretations have been resolv
ed with reciprocal space analysis, allowing us to obtain band paramete
rs such as Delta(SO) = 17.0 +/- 1 meV and Delta(CF) = 9.8 +/- 1 meV wi
th increased confidence. (C) 1998 Published by Elsevier Science S.A.