STRUCTURE AND MAGNETIC-ANISOTROPY OF ELECTROLYTICALLY DEPOSITED NI-FE-MO FILMS

Authors
TOCHITSKII TA BOLTUSHKIN AV
Citation
Ta. Tochitskii et Av. Boltushkin, STRUCTURE AND MAGNETIC-ANISOTROPY OF ELECTROLYTICALLY DEPOSITED NI-FE-MO FILMS, Russian metallurgy. Metally, (5), 1997, pp. 138-143
Citations number
14
Journal title
Russian metallurgy. Metally → ACNP
ISSN journal
00360295
Issue
5
Year of publication
1997
Pages
138 - 143
Database
ISI
SICI code
0036-0295(1997):5<138:SAMOED>2.0.ZU;2-K
Abstract
The structure and perpendicular magnetic anisotropy of Ni-Fe-Mo film i s investigated as a function of the deposit thickness. The presence of local internal stress in the deposits is the basic reason for transit ion of the films to a supercritical state and the formation of a band domain structure.