SURFACE DAMAGE OF VANADIUM AND V-5TI-5CR ALLOY ON BOMBARDMENT BY ION-BEAMS AND STEADY AND PULSED HYDROGEN-PLASMA FLUXES

The sputtering coefficients of vanadium and V-5 Ti-5 Cr alloy by Ar+ i ons correlate well with the theoretical values, whereas the experiment al values of the sputtering coefficients of vanadium by H+ ions are sm aller than the theoretical values by a factor of approximately 3-4, Bo mbardment of these materials by steady and pulsed fluxes of hydrogen p lasma leads to hardening of their surface; under the action of steady hydrogen plasma, etching of the surface is observed, whereas pulsed hy drogen plasma results in cracking of the surface.