THE COMPLEMENTARY NATURE OF X-RAY PHOTOELECTRON-SPECTROSCOPY AND ANGLE-RESOLVED X-RAY-DIFFRACTION - PART-II - ANALYSIS OF OXIDES ON DENTAL ALLOYS

Citation
Sj. Kerber et al., THE COMPLEMENTARY NATURE OF X-RAY PHOTOELECTRON-SPECTROSCOPY AND ANGLE-RESOLVED X-RAY-DIFFRACTION - PART-II - ANALYSIS OF OXIDES ON DENTAL ALLOYS, Journal of materials engineering and performance, 7(3), 1998, pp. 334-342
Citations number
30
Categorie Soggetti
Material Science
ISSN journal
10599495
Volume
7
Issue
3
Year of publication
1998
Pages
334 - 342
Database
ISI
SICI code
1059-9495(1998)7:3<334:TCNOXP>2.0.ZU;2-O
Abstract
X-ray photoelectron spectroscopy (XPS) and angle-resolved x-ray diffra ction (ARXRD) were used to analyze the oxide layer on three palladium- gallium-based dental casting alloys. The oxide layers were approximate ly 10 mu m thick. The use of the techniques helped to determine which mechanism was responsible for oxide formation-either (a) oxide layer g rowth via diffusion of oxygen through the scale to the metal, causing the scale to grow at the metal-oxide interface, or (b) an oxide layer formed by metal ions diffusing through the scale to the surface and re acting with oxygen, causing the scale to grow at the oxide-air interfa ce. The oxide growth mechanisms were correlated to previous layer adhe sion results determined with biaxial flexure testing.