Sj. Kerber et al., THE COMPLEMENTARY NATURE OF X-RAY PHOTOELECTRON-SPECTROSCOPY AND ANGLE-RESOLVED X-RAY-DIFFRACTION - PART-II - ANALYSIS OF OXIDES ON DENTAL ALLOYS, Journal of materials engineering and performance, 7(3), 1998, pp. 334-342
X-ray photoelectron spectroscopy (XPS) and angle-resolved x-ray diffra
ction (ARXRD) were used to analyze the oxide layer on three palladium-
gallium-based dental casting alloys. The oxide layers were approximate
ly 10 mu m thick. The use of the techniques helped to determine which
mechanism was responsible for oxide formation-either (a) oxide layer g
rowth via diffusion of oxygen through the scale to the metal, causing
the scale to grow at the metal-oxide interface, or (b) an oxide layer
formed by metal ions diffusing through the scale to the surface and re
acting with oxygen, causing the scale to grow at the oxide-air interfa
ce. The oxide growth mechanisms were correlated to previous layer adhe
sion results determined with biaxial flexure testing.