The etch rate of 42 Alloy in iron (III) chloride etchant is measured i
n order to investigate the effects of agitation speed, etchant concent
ration, temperature, co-existing foreign metal ions and resist hole di
ameter. The rate increased at first and gradually decreased in accorda
nce with increasing etchant concentration. The activation energies are
12 and 24-30 kJ/mol at a low concentration and at a higher concentrat
ion, respectively. Foreign metal ions in etchants significantly suppre
ssed the etch rate. The etch rate increased with decreasing diameter o
f the resist hole due to the effect of side etch.