CHARGE-CARRIER EXCLUSION AND ACCUMULATION INTENSIFIED BY OHMIC CONTACTS

Citation
Vk. Malyutenko et al., CHARGE-CARRIER EXCLUSION AND ACCUMULATION INTENSIFIED BY OHMIC CONTACTS, Semiconductors, 32(5), 1998, pp. 568-571
Citations number
8
Categorie Soggetti
Physics, Condensed Matter
Journal title
ISSN journal
10637826
Volume
32
Issue
5
Year of publication
1998
Pages
568 - 571
Database
ISI
SICI code
1063-7826(1998)32:5<568:CEAAIB>2.0.ZU;2-E
Abstract
The effect of the high generation-recombination power of an ohmic cont act (S contact) on exclusion-accumulation processes in structures with an antiblocking contact (asymmetric structures of the type p(+)-p-S) was studied theoretically and experimentally. It is shown that, in con trast to the ordinarily studied symmetric structure p(+)-p-p(+), the a symmetric structures, which is being studied, forms a region of accumu lation or exclusion, depending on the direction of the current. The no nequilibrium carrier density in the accumulation layer is much higher while the exclusion region is longer than in the symmetric structure. A density n 100 times higher than the equilibrium value n(o) was obtai ned experimentally for Ge at 300 K. The length of the exclusion region reached 96% of the sample length. Applications of structures with ant iblocking and ohmic contacts based on narrow-gap materials are propose d. (C) 1998 American Institute of Physics. [S1063-7826(98)02505-8].