T. Hanabusa et al., NUMERICAL-SIMULATION OF MONOSILANE CONVER SION AND FINE ELUTRIATION IN POLYCRYSTALLINE SILICON PARTICLE-PRODUCTION VIA FLUIDIZED-BED CVD, Kagaku kogaku ronbunshu, 23(6), 1997, pp. 828-834
Numerical simulation of polycrystalline silicon particle production by
fluidized bed CVD using monosilane is carried out. The model consists
of a Kunii-Levenspiel fluidized bed model and reaction kinetics of mo
nosilane pyrolysis in the free space and on particles. Conversion of m
onosilane, conversion to fines (fines elutriation), and vertical tempe
rature profile in the bubble are calculated using the present model. E
ffects of scavenging of the fines, deposition on the fines and the tem
perature profile on the conversions are discussed. The numerical resul
ts are compared with the experimental results of Hsu et al,. The numer
ical results of the conversions in the case of deposition on the fines
are larger than those without deposition, while other factors give lo
wer conversions. Consideration of deposition on the fines is found to
be essential to explain the experimental results. The diameter of seco
ndary particles of fines agglomerates should be taken into account as
a function of bed temperature, It is suggested that the experimentally
observed effect of the bed temperature on the fines elutriation is po
ssibly explained when the degree of scavenging or the diameter of seco
ndary particles is increased with increasing bed temperature, both of
which are caused by the increase in fines' adhesivity with temperature
.